A Numerical Analysis of Polymer Flow in Thermal Nanoimprint Lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김국원 | - |
dc.contributor.author | 김남웅 | - |
dc.contributor.author | 이우영 | - |
dc.date.accessioned | 2021-08-12T07:28:06Z | - |
dc.date.available | 2021-08-12T07:28:06Z | - |
dc.date.created | 2021-06-17 | - |
dc.date.issued | 2010 | - |
dc.identifier.issn | 1738-2270 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/sch/handle/2021.sw.sch/18291 | - |
dc.description.abstract | Nanoimprint lithography (NIL) is an emerging technology enabling cost effective and high throughput nanofabrication. To successfully imprint a nanometer scale patterns, the understanding of the mechanism in nanoimprint forming is essential. In this paper, a numerical analysis of polymer flow in thermal NIL was performed. First, a finite element model of the periodic mold structure with prescribed boundary conditions was established. Then, the volume of fluid (VOF) and grid deformation method were utilized to calculate the free surfaces of the polymer flow based on an Eulerian grid system. From the simulation, the velocity fields and the imprinting pressure for constant imprinting velocity in thermal NIL were obtained. The velocity field is significant because it can directly describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming. Effects of different mold shapes and various thicknesses of polymer resist were also investigated. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | 한국반도체디스플레이기술학회 | - |
dc.title | A Numerical Analysis of Polymer Flow in Thermal Nanoimprint Lithography | - |
dc.title.alternative | A Numerical Analysis of Polymer Flow in Thermal Nanoimprint Lithography | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | 김국원 | - |
dc.identifier.bibliographicCitation | 반도체디스플레이기술학회지, v.9, no.3, pp.29 - 34 | - |
dc.relation.isPartOf | 반도체디스플레이기술학회지 | - |
dc.citation.title | 반도체디스플레이기술학회지 | - |
dc.citation.volume | 9 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 29 | - |
dc.citation.endPage | 34 | - |
dc.type.rims | ART | - |
dc.identifier.kciid | ART001486519 | - |
dc.description.journalClass | 2 | - |
dc.description.journalRegisteredClass | kci | - |
dc.subject.keywordAuthor | Nanoimprint Lithography | - |
dc.subject.keywordAuthor | Numerical Analysis | - |
dc.subject.keywordAuthor | Polymer Flow | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(31538) 22, Soonchunhyang-ro, Asan-si, Chungcheongnam-do, Republic of Korea+82-41-530-1114
COPYRIGHT 2021 by SOONCHUNHYANG UNIVERSITY ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.