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Results 1-1 of 1 (Search time: 0.004 seconds).
Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors
open access
Kim, Ho Jun; Lee, Kyungjun;
Park, Hwanyeol
Article
Issue Date
2024
Citation
PLASMA SOURCES SCIENCE & TECHNOLOGY, v.33, no.1
Publisher
IOP Publishing Ltd
1
Discover
Author
Park, Hwan yeol
1
Kim, Ho Jun
1
Subject
capacitively coupled plasma
1
CHEMICAL-VAPOR-DEPOSITION
1
dielectric element
1
fluid simulation
1
hydrogenated amorphous silicon
1
plasma enhanced chemical vapor de...
1
RADIOFREQUENCY DISCHARGES
1
SIMULATION
1
uniformity
1
Date Issued
2024
1
Type
Article
1
Language
ENG
1
Journal
PLASMA SOURCES SCIENCE & TECH...
1
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