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Surface Morphology and Optical Properties of Aluminosilicate Glass Manufactured by Physical and Chemical Etching Process

Authors
Kim, NamhyukSohn, JeongilKim, Gwangsoo
Issue Date
Sep-2017
Publisher
한국재료학회
Keywords
anti-glare; aluminosilicate glass; etching; haze; transmittance
Citation
한국재료학회지, v.27, no.9, pp 501 - 506
Pages
6
Journal Title
한국재료학회지
Volume
27
Number
9
Start Page
501
End Page
506
URI
https://scholarworks.bwise.kr/sch/handle/2021.sw.sch/7273
DOI
10.3740/MRSK.2017.27.9.501
ISSN
1225-0562
2287-7258
Abstract
Surface morphology and optical properties such as transmittance and haze effect of glass etched by physical and chemical etching processes were investigated. The physical etching process was carried out by pen type sandblasting process with 15 similar to 20 mu m dia. of Al2O3 media; the chemical etching process was conducted using HF-based mixed etchant. Sandblasting was performed in terms of variables such as the distance of 8 cm between the gun nozzle and the glass substrate, the fixed air pressure of 0.5bar, and the constant speed control of the specimen stage. The chemical etching process was conducted with mixed etching solution prepared by combination of BHF (Buffered Hydrofluoric Acid), HCl, and distilled water. The morphology of the glass surface after sandblasting process displayed sharp collision vestiges with nonuniform shapes that could initiate fractures. The haze values of the sandblasted glass were quantitatively acceptable. However, based on visual observation, the desirable Anti-Glare effect was not achieved. On the other hand, irregularly shaped and sharp vestiges transformed into enlarged and smooth micro-spherical craters with the subsequent chemical etching process. The curvature of the spherical crater increased distinctly by 60 minutes and decreased gradually with increasing etching time. Further, the spherical craters with reduced curvature were uniformly distributed over the etched glass surface. The haze value increased sharply up to 55 % and the transmittance decreased by 90 % at 60 minutes of etching time. The ideal haze value range of 3 similar to 7 % and transmittance value range of above 90 % were achieved in the period of 240 to 720 minutes of etching time for the selected concentration of the chemical etchant.
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