Pham, D.P.[Pham, D.P.]; Lee, S.[Lee, S.]; Quddamah, Khokhar M.[Quddamah, Khokhar M.]; Chowdhury, S.[Chowdhury, S.]; Park, H.[Park, H.]; Kim, Y.[Kim, Y.]; Cho, E.-C.[Cho, E.-C.]; Yi, J.[Yi, J.]
ArticleIssue Date2021CitationChemical Engineering Journal, v.423PublisherElsevier B.V.