Kim, JW[Kim, Jae-Won]; Kim, EH[Kim, Eun-Hye]; Han, GD[Han, Ga-Dug]; Noh, SH[Noh, Seung-Hyun]; Pyun, DG[Pyun, Do-Gi]; Ito, Y[Ito, Yoshihiro]; Nah, JW[Nah, Jae-Woon]; Lee, JG[Lee, Jae-Gwan]; Son, TI[Son, Tae-Il]
ArticleIssue Date2017CitationJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.54, pp.350 - 358PublisherELSEVIER SCIENCE INC