Kim, J.[Kim, J.]; Lee, I.[Lee, I.]; Kim, Y.-H.[Kim, Y.-H.]; Ho, Bae J.[Ho, Bae J.]; Hwang, K.[Hwang, K.]; Kang, H.[Kang, H.]; Shim, J.-H.[Shim, J.-H.]; Kim, J.-S.[Kim, J.-S.]; Wan, Park C.[Wan, Park C.]; Kim, Y.-M.[Kim, Y.-M.], et al.
ArticleIssue Date2023CitationChemical Engineering Journal, v.455PublisherElsevier B.V.