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Increased Work Function in Few-Layer Graphene Sheets via Metal Chloride Doping

Authors
Kwon, Ki ChangChoi, Kyoung SoonKim, Soo Young
Issue Date
Nov-2012
Publisher
WILEY-V C H VERLAG GMBH
Keywords
graphene; chemical vapor deposition (CVD); work-function engineering; X-ray photoemission spectroscopy (XPS); ultraviolet photoemission spectroscopy (UPS)
Citation
ADVANCED FUNCTIONAL MATERIALS, v.22, no.22, pp 4724 - 4731
Pages
8
Journal Title
ADVANCED FUNCTIONAL MATERIALS
Volume
22
Number
22
Start Page
4724
End Page
4731
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/20020
DOI
10.1002/adfm.201200997
ISSN
1616-301X
1616-3028
Abstract
A chemical approach to controlling the work function of few-layer graphene is investigated. Graphene films are synthesized on Cu foil by chemical vapor deposition. Six metal chlorides, AuCl3, IrCl3, MoCl3, OsCl3, PdCl2, and RhCl3, are used as dopants. The sheet resistance of the doped graphene decreases from 1100 Omega/sq to approximate to 500700 Omega/sq and its transmittance at 550 nm also decreases from 96.7% to 93% for 20 mM AuCl3 due to the formation of metal particles. The sheet resistance and transmittance are reduced with increasing metal chloride concentration. The G peak in the Raman spectra is shifted to a higher wavenumber after metal chloride doping, which indicates a charge transfer from graphene to metal ions. The intensity ratio of IC?C/IC-C increases with doping, indicating an electron transfer from graphene sheets to metal ions. Ultraviolet photoemission spectroscopy data shows that the work function of graphene increases from 4.2 eV to 5.0, 4.9, 4.8, 4.68, 5.0, and 5.14 eV for the graphene with 20 mM AuCl3, IrCl3, MoCl3, OsCl3, PdCl2, and RhCl3, respectively. It is considered that spontaneous charge transfer occurs from the specific energy level of graphene to the metal ions, thus increasing the work function.
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