Optimal parameter retrieval for metamaterial absorbers using the least-square method for wide incidence angle insensitivity
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Dongju | - |
dc.contributor.author | Trung, Nguyen Toan | - |
dc.contributor.author | Moon, Un-Chul | - |
dc.contributor.author | Lim, Sungjoon | - |
dc.date.available | 2019-03-08T08:38:08Z | - |
dc.date.issued | 2017-06 | - |
dc.identifier.issn | 1559-128X | - |
dc.identifier.issn | 2155-3165 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/4343 | - |
dc.description.abstract | In this paper, we propose a specific algorithm based on the least-square method to predict the incidence angle insensitivity of a metamaterial absorber. The proposed algorithm was analyzed on a metamaterial absorber design with circular sectors on the top layer and a full copper cover on the bottom layer. We retrieved the parameters of inductance, capacitance, and conductance from the equivalent circuit of the metamaterial absorber at different incidence angles of 0 degrees, 30 degrees, 65 degrees, and 70 degrees under both transverse electric and transverse magnetic polarization. The complex impedances calculated from the optimal parameter retrieval are compared with the complex impedances from full-wave simulation at each incidence angle. The calculated and simulated results show excellent agreement, and the proposed algorithm can be used to design angle-insensitive metamaterial absorbers. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | OPTICAL SOC AMER | - |
dc.title | Optimal parameter retrieval for metamaterial absorbers using the least-square method for wide incidence angle insensitivity | - |
dc.type | Article | - |
dc.identifier.doi | 10.1364/AO.56.004670 | - |
dc.identifier.bibliographicCitation | APPLIED OPTICS, v.56, no.16, pp 4670 - 4674 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000402579600014 | - |
dc.identifier.scopusid | 2-s2.0-85020247209 | - |
dc.citation.endPage | 4674 | - |
dc.citation.number | 16 | - |
dc.citation.startPage | 4670 | - |
dc.citation.title | APPLIED OPTICS | - |
dc.citation.volume | 56 | - |
dc.type.docType | Article | - |
dc.publisher.location | 미국 | - |
dc.subject.keywordPlus | DOUBLE-NEGATIVE METAMATERIALS | - |
dc.subject.keywordPlus | EQUIVALENT-CIRCUIT MODEL | - |
dc.subject.keywordPlus | WAVELENGTHS | - |
dc.subject.keywordPlus | EXTRACTION | - |
dc.subject.keywordPlus | FIELDS | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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