Preparation Method of the RuO2 Film on a Silver Substrate Using the Cyclic Voltammetry
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeon, Yeojin | - |
dc.contributor.author | Kim, Sangyeop | - |
dc.contributor.author | Yim, Sanggyu | - |
dc.contributor.author | Yoon, Sungho | - |
dc.date.accessioned | 2021-06-18T09:42:07Z | - |
dc.date.available | 2021-06-18T09:42:07Z | - |
dc.date.issued | 2013-12 | - |
dc.identifier.issn | 1555-130X | - |
dc.identifier.issn | 1555-1318 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/45820 | - |
dc.description.abstract | A simple and eco friendly cyclic voltammetric (CV) deposition method of ruthenium oxides on a silver substrate was investigated to prepare a catalytic film with high porosity that could be applied as the anode of a photoelectrochemical cell to split water into electrons, protons, and dioxygen. The thickness of the uniformly formed RuO2 film could be controlled by varying the cycle numbers of deposition processes. This slow electrodeposition method may offer diverse advantages compared to other techniques including easy modulation of film growth by varying the applied potential, electrolyte composition, cycle number and deposition time. | - |
dc.format.extent | 4 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
dc.title | Preparation Method of the RuO2 Film on a Silver Substrate Using the Cyclic Voltammetry | - |
dc.type | Article | - |
dc.identifier.doi | 10.1166/jno.2013.1516 | - |
dc.identifier.bibliographicCitation | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, v.8, no.6, pp 584 - 587 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000332662400023 | - |
dc.identifier.scopusid | 2-s2.0-84894123832 | - |
dc.citation.endPage | 587 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 584 | - |
dc.citation.title | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | - |
dc.citation.volume | 8 | - |
dc.type.docType | Article | - |
dc.publisher.location | 미국 | - |
dc.subject.keywordAuthor | Thin RuO2 Film | - |
dc.subject.keywordAuthor | Electrodeposition | - |
dc.subject.keywordAuthor | Silver Substrate | - |
dc.subject.keywordAuthor | Cyclic Voltammetric | - |
dc.subject.keywordPlus | HYDROUS RUTHENIUM OXIDE | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | ELECTRODES | - |
dc.subject.keywordPlus | DIOXIDE | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
84, Heukseok-ro, Dongjak-gu, Seoul, Republic of Korea (06974)02-820-6194
COPYRIGHT 2019 Chung-Ang University All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.