Effect of pulsed light irradiation on patterning of reduction graphene oxide-graphene oxide interconnects for power devices
- Authors
- Choi, E.; Pyo, S.
- Issue Date
- Sep-2021
- Publisher
- MDPI
- Keywords
- Graphene pattern; Photocatalyst; Pulsed photon energy
- Citation
- Coatings, v.11, no.9
- Journal Title
- Coatings
- Volume
- 11
- Number
- 9
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/49176
- DOI
- 10.3390/coatings11091042
- ISSN
- 2079-6412
2079-6412
- Abstract
- Reduction graphene oxide (r-GO) lines on graphene oxide (GO) films can be prepared by a photocatalytic reduction and photothermal reduction method. A mechanism of partial GO reduction by pulsed photon energy is identified for preparing patterned rGO-GO films. The photocatalytic reduction method efficiently reduces GO at low photon energies. The successful production of a patterned rGO-GO film without damage by the photo thermal reduction method is possible when an energy density of 6.0 or 6.5 J/m2 per pulse is applied to a thin GO film (thickness: 0.45 µm). The lowest resistance obtained for a photo-reduced rGO line is 0.9 kΩ sq−1 . The GO-TiO2 pattern fabricated on the 0.23 µm GO-TiO2 composite sheet through the energy density of each pulse is 5.5 J/m2 for three pulses. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
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