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Fabrication of a bilayer wire grid polarizer in the near infrared wavelength region by using a UV curing nanoimprinting method

Authors
Lee, Yong HoPeranantham, PazhanisamiHwangbo, Chang KwonKim, Seok-Min
Issue Date
Nov-2012
Publisher
KOREAN PHYSICAL SOC
Keywords
Bilayer wire grid polarizer; Subwavelength grating; Nanoimprint lithography
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.61, no.10, pp 1714 - 1719
Pages
6
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
61
Number
10
Start Page
1714
End Page
1719
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/52961
DOI
10.3938/jkps.61.1714
ISSN
0374-4884
1976-8524
Abstract
In this study, we have designed and fabricated an Al bilayer wire grid polarizer (B-WGP) in the near-infrared wavelength region. A finite difference time domain method was employed to design and analyze the subwavelength B-WGP with a period of 450 nm, a grating height of 150 nm, and a duty cycle of 0.5. The high polarization extinction ratio of 1200 indicates that the B-WGP may be used as a normal incidence polarization beam splitter. A subwavelength polymer pattern was fabricated by using an UV curing nanoimprinting method, and an Al thin film was deposited by using a thermal evaporation method. The experimental results show that the transmittance of the TM-wave of the B-WGP is over 50% at wavelengths in the range 1000 similar to 2000 nm wavelength while the transmittance of the TE-wave is less than 1%, and that the polarization extinction ratio 250. The discrepancies between the simulated and the experimental results are discussed.
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공과대학 (기계공학부)
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