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Enhancement of output intensity limit of semiconductor lasers by chemical passivation of mirror facets
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yoo, Jae Soo | - |
| dc.contributor.author | Lee, Hong H. | - |
| dc.contributor.author | Zory, Peter | - |
| dc.date.accessioned | 2022-05-11T03:40:19Z | - |
| dc.date.available | 2022-05-11T03:40:19Z | - |
| dc.date.issued | 1991-03 | - |
| dc.identifier.issn | 1041-1135 | - |
| dc.identifier.issn | 1941-0174 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/57563 | - |
| dc.description.abstract | Chemical treatment of the mirror facets of semiconductor lasers is used to reduce nonradiative recombination centers, thereby enhancing their peak output power capabilities. Treatment of the surface with P2S5-NH4OH coupled with washing by (NH4)2S can more than double the output intensity limit. However, the enhancement that can be obtained on a consistent basis is lower. | - |
| dc.format.extent | 2 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
| dc.title | Enhancement of output intensity limit of semiconductor lasers by chemical passivation of mirror facets | - |
| dc.type | Article | - |
| dc.identifier.doi | 10.1109/68.79753 | - |
| dc.identifier.bibliographicCitation | IEEE PHOTONICS TECHNOLOGY LETTERS, v.3, no.3, pp 202 - 203 | - |
| dc.description.isOpenAccess | N | - |
| dc.identifier.wosid | A1991FJ07000006 | - |
| dc.identifier.scopusid | 2-s2.0-0026123784 | - |
| dc.citation.endPage | 203 | - |
| dc.citation.number | 3 | - |
| dc.citation.startPage | 202 | - |
| dc.citation.title | IEEE PHOTONICS TECHNOLOGY LETTERS | - |
| dc.citation.volume | 3 | - |
| dc.type.docType | Article | - |
| dc.publisher.location | 미국 | - |
| dc.subject.keywordPlus | GAAS | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Optics | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Optics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
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