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Design and Fabrication of Millimeter-Wave Frequency-Tunable Metamaterial Absorber Using MEMS Cantilever Actuatorsopen access

Authors
Chung, MyungjinJeong, HeijunKim, Yong-KweonLim, Sung JoonBaek, Chang-Wook
Issue Date
Aug-2022
Publisher
MDPI
Keywords
millimeter wave; frequency tunable; metamaterial absorber; MEMS cantilever; stress-gradient; plasma ashing
Citation
MICROMACHINES, v.13, no.8
Journal Title
MICROMACHINES
Volume
13
Number
8
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/58929
DOI
10.3390/mi13081354
ISSN
2072-666X
2072-666X
Abstract
In this paper, a MEMS (Micro Electro Mechanical Systems)-based frequency-tunable metamaterial absorber for millimeter-wave application was demonstrated. To achieve the resonant-frequency tunability of the absorber, the unit cell of the proposed metamaterial was designed to be a symmetric split-ring resonator with a stress-induced MEMS cantilever array having initial out-of-plane deflections, and the cantilevers were electrostatically actuated to generate a capacitance change. The dimensional parameters of the absorber were determined via impedance matching using a full electromagnetic simulation. The designed absorber was fabricated on a glass wafer with surface micromachining processes using a photoresist sacrificial layer and the oxygen-plasma-ashing process to release the cantilevers. The performance of the fabricated absorber was experimentally validated using a waveguide measurement setup. The absorption frequency shifted down according to the applied DC (direct current) bias voltage from 28 GHz in the initial off state to 25.5 GHz in the pull-down state with the applied voltage of 15 V. The measured reflection coefficients at those frequencies were -5.68 dB and -33.60 dB, corresponding to the peak absorptivity rates of 72.9 and 99.9%, respectively.
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창의ICT공과대학 (전자전기공학부)
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