The effect of stoichiometric La1/2Sr1/2CoO3 as sputtered bottom electrode on SiO2/Si(100)
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, J.-H. | - |
dc.contributor.author | Koh, K.S. | - |
dc.contributor.author | Choo, W.K. | - |
dc.date.accessioned | 2023-03-09T01:56:05Z | - |
dc.date.available | 2023-03-09T01:56:05Z | - |
dc.date.issued | 2003-04 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.issn | 1976-8524 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/65720 | - |
dc.description.abstract | In this study, we have investigated the ferroelectric and electrical properties of PZT 40/60 films on bottom La1/2Sr1/2CoO3(LSCO) electrode. Also, to investigate LSCO as the bottom electrode, this LSCO thin film was sputtered on SiO2/Si(100) wafer with several LSCO target compositions. As excess Co or Sr is added to the LSCO target, the resistivity of the LSCO thin film has achieved the minimum value with the 5 at% Co and Sr excess target. For the ferroelectric properties, this particular capacitor with the aforementioned electrode shows better properties than others with the LSCO bottom electrodes deposited with different LSCO target compositions. | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.title | The effect of stoichiometric La1/2Sr1/2CoO3 as sputtered bottom electrode on SiO2/Si(100) | - |
dc.type | Article | - |
dc.identifier.bibliographicCitation | Journal of the Korean Physical Society, v.42, no.SUPPL., pp S1313 - S1316 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.scopusid | 2-s2.0-26344477485 | - |
dc.citation.endPage | S1316 | - |
dc.citation.number | SUPPL. | - |
dc.citation.startPage | S1313 | - |
dc.citation.title | Journal of the Korean Physical Society | - |
dc.citation.volume | 42 | - |
dc.type.docType | Conference Paper | - |
dc.publisher.location | 대한민국 | - |
dc.subject.keywordAuthor | Ferroelectric properties | - |
dc.subject.keywordAuthor | LSCO | - |
dc.subject.keywordAuthor | PZT | - |
dc.subject.keywordAuthor | Sputtering | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
84, Heukseok-ro, Dongjak-gu, Seoul, Republic of Korea (06974)02-820-6194
COPYRIGHT 2019 Chung-Ang University All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.