Cluster deposition study by molecular dynamics simulation: Al and Cu cluster
DC Field | Value | Language |
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dc.contributor.author | Kang, JW | - |
dc.contributor.author | Choi, KS | - |
dc.contributor.author | Kang, JC | - |
dc.contributor.author | Kang, ES | - |
dc.contributor.author | Byun, KR | - |
dc.contributor.author | Hwang, HJ | - |
dc.date.accessioned | 2023-03-09T03:47:03Z | - |
dc.date.available | 2023-03-09T03:47:03Z | - |
dc.date.issued | 2001-07 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.issn | 1520-8559 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/66204 | - |
dc.description.abstract | The ionized cluster beam deposition of Al and Cu clusters has been investigated with a classical molecular dynamics simulation and the Metropolis Monte-Carlo simulation. The spreading of the cluster has been studied as functions of cluster size and initial cluster energy. When the local area reached the local melting spot on the surface around the impact point of an energetic cluster, during a few ps. intermixing was easily achieved and a good epitaxial film with optimum bulk density was formed. For uniform film growth using a cluster impact, it is necessary to make the local area temperature higher than melting temperature on the surface around the impact point of an energetic cluster. (C) 2001 American Vacuum Society. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Cluster deposition study by molecular dynamics simulation: Al and Cu cluster | - |
dc.type | Article | - |
dc.identifier.doi | 10.1116/1.1379318 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.19, no.4, pp 1902 - 1906 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000170111100066 | - |
dc.identifier.scopusid | 2-s2.0-84994862704 | - |
dc.citation.endPage | 1906 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 1902 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | - |
dc.citation.volume | 19 | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.publisher.location | 미국 | - |
dc.subject.keywordAuthor | Al | - |
dc.subject.keywordAuthor | Cu | - |
dc.subject.keywordPlus | THIN-FILM GROWTH | - |
dc.subject.keywordPlus | BEAM DEPOSITION | - |
dc.subject.keywordPlus | IMPACT FUSION | - |
dc.subject.keywordPlus | SURFACE | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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