Raman spectroscopic study on NiO thin film산화니켈 박막에 대한 라만 분광 연구
- Authors
- An, Ji-won; Seong, Maeng-Je
- Issue Date
- Dec-2005
- Publisher
- 중앙대학교 기초과학연구소
- Citation
- 기초과학연구소 논문집, v.19, pp 69 - 82
- Pages
- 14
- Journal Title
- 기초과학연구소 논문집
- Volume
- 19
- Start Page
- 69
- End Page
- 82
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/72830
- Abstract
- Polycrystalline NiO thin films were prepared on the Pt substrate by the DC reactive sputtering in different oxygen content circumstances. And then Raman measurements were performed at room temperature. In the Raman spectrum of the samples two increased main peaks of the Raman intensity were observed by the linear increase of oxygen content. One is located around 540cm-1 and another is around 1500cm-1 broadly. Among these two features we concentrated on the Raman feature around 540cm-1. After the Raman data was normalized, in the range from 300cm-1 to 700cm-1 three main peaks were observed. After we assigned these peaks to characteris tic phonon modes in the polycrystalline NiO thin film, we could conclude that because of the structural effects the polycrystalline NiO thin films have a lower defect induced TO phonon energy than the crystal NiO but they have a similar optical property with the Alcalihalide group as ever.
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Collections - College of Natural Sciences > Department of Physics > 1. Journal Articles
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