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Double texturing of glass substrate and ZnO : Al transparent electrode surfaces for high performance thin film solar cells

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dc.contributor.authorKang, Dong-Won-
dc.date.accessioned2024-07-18T01:37:41Z-
dc.date.available2024-07-18T01:37:41Z-
dc.date.issued2017-08-
dc.identifier.issn1975-8359-
dc.identifier.issn2287-4364-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/74906-
dc.description.abstractWe studied surface texture-etching of glass substrate by using reactive ion etching process with various working pressure (0.7~9.0 mT). With the increase in the pressure, a haze parameter, which means diffusive transmittance/total transmittance, was increased in overall wavelength regions, as measured by spectrophotometer. Also, atomic force microscopy (AFM) study also showed that the surface topography transformed from V-shaped, keen surface to U-shaped, flattened surface, which is beneficial for nanocrystalline silicon semiconductor growth with suppressing defective crack formation. The texture-etched ZnO:Al combined with textured glass exhibited pronounced haze properties that showed 60~90 % in overall spectral wavelength regions. This promising optical properties of double textured, transparent conducting substrate can be widely applied in silicon thin film photovoltaics and other optoelectronic devices. Copyright © The Korean Institute of Electrical Engineers.-
dc.format.extent6-
dc.language한국어-
dc.language.isoKOR-
dc.publisherKorean Institute of Electrical Engineers-
dc.titleDouble texturing of glass substrate and ZnO : Al transparent electrode surfaces for high performance thin film solar cells-
dc.title.alternative고성능 박막태양전지를 위한 유리 기판 및 산화 아연 투명 전극의 2중 구조 표면 조직화 공정 연구-
dc.typeArticle-
dc.identifier.doi10.5370/KIEE.2017.66.8.1230-
dc.identifier.bibliographicCitationTransactions of the Korean Institute of Electrical Engineers, v.66, no.8, pp 1230 - 1235-
dc.identifier.kciidART002248988-
dc.description.isOpenAccessN-
dc.identifier.scopusid2-s2.0-85030650552-
dc.citation.endPage1235-
dc.citation.number8-
dc.citation.startPage1230-
dc.citation.titleTransactions of the Korean Institute of Electrical Engineers-
dc.citation.volume66-
dc.type.docTypeArticle-
dc.publisher.location대한민국-
dc.subject.keywordAuthorAl-doped ZnO-
dc.subject.keywordAuthorGlass substrate-
dc.subject.keywordAuthorReactive ion etching-
dc.subject.keywordAuthorSolar energy-
dc.subject.keywordAuthorThin film solar cell-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
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Kang, Dong-Won
공과대학 (에너지시스템 공학부)
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