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Efficient light incoupling into silicon thin-film solar cells by anti-reflecting MgO/high-compact-AZO with air-side textured glass

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dc.contributor.authorKang, Dong-Won-
dc.contributor.authorLee, Heon-Min-
dc.contributor.authorHan, Min-Koo-
dc.date.accessioned2024-07-18T03:00:29Z-
dc.date.available2024-07-18T03:00:29Z-
dc.date.issued2013-12-
dc.identifier.issn0022-3727-
dc.identifier.issn1361-6463-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/74946-
dc.description.abstractLight incoupling effects have been enhanced at front interfaces of silicon (Si) thin-film solar cells. Firstly, a MgO thin film was introduced at glass substrate/Al-doped ZnO (AZO) interface for anti-reflection effect. We additionally found that the surface morphology of AZO films grown on MgO film after texture-etching is dependent on the compactness of AZO. For high-compact AZO films, the texture-etched MgO/AZO double layer exhibited significantly enhanced light-scattering capability. Secondly, we made textured surfaces at air/glass interface through simple plasma-etching without sacrificial layers or masks by optimizing the etching pressure. The additional air-side texture contributed to further improvement of total light scattering from the MgO/AZO-coated glass substrate. Fabricated microcrystalline Si thin-film solar cells employing the MgO coated glass with air-side surface texture showed decreased cell reflectance and increased quantum efficiency. The J(sc) increased from 21.7 to 26.5 mA cm-(2) and final efficiency of 9.49% was achieved. Based on our experimental results, the suggested structure, the MgO coating on glass substrate of which air-side surface is texture-etched, can offer a promising approach to improve the light incoupling and efficiency of Si thin-film solar cells.-
dc.language영어-
dc.language.isoENG-
dc.publisherIOP PUBLISHING LTD-
dc.titleEfficient light incoupling into silicon thin-film solar cells by anti-reflecting MgO/high-compact-AZO with air-side textured glass-
dc.typeArticle-
dc.identifier.doi10.1088/0022-3727/46/48/485107-
dc.identifier.bibliographicCitationJOURNAL OF PHYSICS D-APPLIED PHYSICS, v.46, no.48-
dc.description.isOpenAccessN-
dc.identifier.wosid000327539500013-
dc.identifier.scopusid2-s2.0-84889047113-
dc.citation.number48-
dc.citation.titleJOURNAL OF PHYSICS D-APPLIED PHYSICS-
dc.citation.volume46-
dc.type.docTypeArticle-
dc.publisher.location영국-
dc.subject.keywordPlusMICROCRYSTALLINE SILICON-
dc.subject.keywordPlusZINC-OXIDE-
dc.subject.keywordPlusTCO-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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Kang, Dong-Won
공과대학 (에너지시스템 공학부)
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