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Boron and Aluminum Codoped ZnO Transparent Conducting Films with High Electrical Stability

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dc.contributor.authorKang, Dong-Won-
dc.contributor.authorKwon, Jang-Yeon-
dc.contributor.authorLee, Do-Joong-
dc.contributor.authorHan, Min-Koo-
dc.date.accessioned2024-07-18T04:31:27Z-
dc.date.available2024-07-18T04:31:27Z-
dc.date.issued2012-
dc.identifier.issn0013-4651-
dc.identifier.issn1945-7111-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/74970-
dc.description.abstractWe suggest boron (B) and aluminum (Al) codoped ZnO (BAZO) transparent conducting thin films with high electrical stability for photovoltaic applications. The resistivity of widely used Al-doped ZnO (AZO) film decreased slightly by B doping. Above all, the resistivity of BAZO (4.9 at. % boron) increased by less than 1.5 times, whereas that of reference AZO film increased by over than 8 times after thermal annealing in atmospheric air. The carrier concentration and Hall mobility were much less degraded in BAZO films. X-ray photoelectron spectroscopy analysis showed that the peak portion related with chemisorbed oxygen at 100 nm-inside of the film was suppressed in BAZO film compared with AZO film. The B atoms would restrain the oxygen permeation into the film, which made the process of oxygen chemisorption inactive. (C) 2011 The Electrochemical Society. [DOI: 10.1149/2.002202jes] All rights reserved.-
dc.language영어-
dc.language.isoENG-
dc.publisherELECTROCHEMICAL SOC INC-
dc.titleBoron and Aluminum Codoped ZnO Transparent Conducting Films with High Electrical Stability-
dc.typeArticle-
dc.identifier.doi10.1149/2.002202jes-
dc.identifier.bibliographicCitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.2, pp H61 - H65-
dc.description.isOpenAccessN-
dc.identifier.wosid000298637500069-
dc.identifier.scopusid2-s2.0-84855338061-
dc.citation.endPageH65-
dc.citation.number2-
dc.citation.startPageH61-
dc.citation.titleJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.volume159-
dc.type.docTypeArticle-
dc.publisher.location미국-
dc.subject.keywordPlusOXIDE THIN-FILMS-
dc.subject.keywordPlusDAMP HEAT-STABILITY-
dc.subject.keywordPlusAL FILMS-
dc.subject.keywordPlusZINC-
dc.subject.keywordPlusRF-
dc.subject.keywordPlusPARAMETERS-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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Kang, Dong-Won
공과대학 (에너지시스템 공학부)
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