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Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography Go to Link

JEON, Young-Doo; OH, HYE KEUN; AN, IL SIN; KIM, Jong-Sun

ArticleIssue Date2005CitationJournal of the Korean Physical Society, v.47, no.2, pp 223 - 227Publisher한국물리학회

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