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Influence of mask surface roughness on 22nm node extreme ultraviolet lithographyGo to Link

Kim, Eun-Jin; You, Jee-Hye; Kim, Seoung-Sue; Cho, Han-Ku; Ahn, Jinho; An, Ilsin; Oh, Hye-Keun

ArticleIssue Date2010CitationProceedings of SPIE - The International Society for Optical Engineering, v.7636, pp 1 - 10PublisherSPIE
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