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Effect of extreme-ultraviolet pellicle support to patterned maskGo to Link

Ko, Ki-ho; Kim, Eun-Jin; Kim, Ji-Won; Park, Jun-Taek; Lim, Chang-Moon; Oh, Hye-keun

ArticleIssue Date2012CitationProceedings of SPIE - The International Society for Optical Engineering, v.8322, pp 1 - 8PublisherSPIE
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