ScholarWorks@Hanyang University ERICA Campus: Browsing ScholarWorks

Browsing by Lee, EMAuthor

Showing results 1 to 2 of 2

SCIESCOPUS

Characterization of 193 nm chemically amplified resist during post exposure bake and post exposure delay Go to Link

Lee, EM; Sung, MG; Lee, YM; Sohn, YS; Oh, HK

ArticleIssue Date1999CitationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.38, no.12B, pp.7094 - 7098PublisherINST PURE APPLIED PHYSICS

SCIESCOPUS

Post exposure bake effect in 193 nm chemically amplified resist

Oh, HK; Sohn, YS; Sung, MG; Lee, YM; Lee, EM; An, I

ArticleIssue Date1999CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.35, pp.S734 - S737PublisherKOREAN PHYSICAL SOC

RSS_1.0 RSS_2.0 ATOM_1.0

55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Browsing by Lee, EMAuthor

BROWSE