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Which mask is preferred for sub-60 nm node imaging?Go to Link

Kim, Sung-Hyuck; Kim, Soon-Ho; Kim, Yong-Hoon; Lee, Jeung-Woo; Woo, Sang-Gyun; Cho, Han-Ku; Oh, Hye-Keun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.9B, pp 6124 - 6127PublisherIOP Publishing Ltd
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