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Surface-modified quantum-dot floating layer using novel thiol with large dipole moment for improved feasibility of light-erasable organic transistor memory applications

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dc.contributor.authorKim, Cheulhwan-
dc.contributor.authorKim, Jae Young-
dc.contributor.authorLee, Kanghuck-
dc.contributor.authorJung, Sun Young-
dc.contributor.authorYun, Dong-Jin-
dc.contributor.authorAn, Tae Kyu-
dc.contributor.authorLee, Hwa Sung-
dc.contributor.authorJeong, Yong Jin-
dc.contributor.authorLee, Jihoon-
dc.date.accessioned2021-06-22T09:04:19Z-
dc.date.available2021-06-22T09:04:19Z-
dc.date.created2021-01-21-
dc.date.issued2020-05-
dc.identifier.issn1226-086X-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/1092-
dc.description.abstractIn this study, a new functional thiol with a pentafluorophenyl group was synthesized for the surface modification of CdSe quantum-dot floating layers; this was aimed at the fabrication of organic field-effect transistors (OFETs). The dipole moments and surface properties of the fluorinated thiols were used to control the transistor operations; these thiols acted as surface modifiers of the CdSe quantum-dot floating layers in the OFETs. Further, the new functional thiol exhibited a larger dipole moment than that of the commercial 2,3,4,5,6-pentafluorothiophenol. The OFET comprising the new functional thiol with the pentafluorophenyl group functioned as a normally ON transistor and exhibited bistable current states during nondestructive reading. In addition, it exhibited sensitive responses to electrical-only and lightonly biases, which demonstrates its feasibility for light-responsive flash memory applications. (C) 2020 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.-
dc.language영어-
dc.language.isoen-
dc.publisher한국공업화학회-
dc.titleSurface-modified quantum-dot floating layer using novel thiol with large dipole moment for improved feasibility of light-erasable organic transistor memory applications-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Hwa Sung-
dc.identifier.doi10.1016/j.jiec.2020.01.031-
dc.identifier.scopusid2-s2.0-85079067492-
dc.identifier.wosid000523605700009-
dc.identifier.bibliographicCitationJournal of Industrial and Engineering Chemistry, v.85, pp.111 - 117-
dc.relation.isPartOfJournal of Industrial and Engineering Chemistry-
dc.citation.titleJournal of Industrial and Engineering Chemistry-
dc.citation.volume85-
dc.citation.startPage111-
dc.citation.endPage117-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryEngineering, Chemical-
dc.subject.keywordPlusSTORAGE-
dc.subject.keywordPlusMONOLAYERS-
dc.subject.keywordAuthorOptical transistor memory-
dc.subject.keywordAuthorCdSe-
dc.subject.keywordAuthorQuantum dots-
dc.subject.keywordAuthorFluorinated thiol-
dc.subject.keywordAuthorDipole moment-
dc.subject.keywordAuthorPhoto-induced recovery-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S1226086X20300514?via%3Dihub-
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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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