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Oxidative Addition of Silicon-Chloride Bonds to a Zerovalent Ruthenium Center and Direct Generation of an Ethylene Insertion Complex

Authors
Yoo, HyojongBerry, Donald H.
Issue Date
Jun-2022
Publisher
American Chemical Society
Citation
Inorganic Chemistry, v.61, no.23, pp 8639 - 8643
Pages
5
Indexed
SCIE
SCOPUS
Journal Title
Inorganic Chemistry
Volume
61
Number
23
Start Page
8639
End Page
8643
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/111351
DOI
10.1021/acs.inorgchem.2c01317
ISSN
0020-1669
1520-510X
Abstract
The oxidative addition of a silicon-chloride (Si-Cl) bond to a metal center can be a key reaction step in coordinative silicon chemistry, but this reaction is seldom observed. Herein, we report direct oxidative addition of the Si-Cl bonds of dimethyldichlorosilane (Me2SiCl2) and cyclotrimethylenedichlorosilane [(CH2)(3)SiCl2] to low-valent ruthenium complexes, yielding the 16e(-) chloro(organosilyl)ruthenium complexes [N-3]Ru(Cl)(SiMe2Cl) (4a) and [N-3]Ru(Cl)(SiCl(CH2)(3)) (4b) ([N-3] = 2,6-(MesN = CMe)(2)C5H3N; Mes = 1,3,5-trimethylphenyl; Me = methyl). The reversible reaction of 4a with ethylene yields an 18e(-) ethylene adduct, in which an ethylene is subsequently inserted into a ruthenium-silicon (Ru-Si) bond to produce the 16e(-) complex [N-3]Ru(Cl)(CH2CH2SiMe2Cl) (7). This study provides a good example of the direct generation of an ethylene insertion product, which is an important intermediate in the catalytic reduction of unsaturated molecules.
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Yoo, Hyo jong
ERICA 공학대학 (ERICA 배터리소재화학공학과)
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