Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO
DC Field | Value | Language |
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dc.contributor.author | Lee, Joon Yup | - |
dc.contributor.author | Kim, Eun A | - |
dc.contributor.author | Han, Jisu | - |
dc.contributor.author | Choi, Yeong-Ho | - |
dc.contributor.author | Hahm, Donghyo | - |
dc.contributor.author | Kang, Chi Jung | - |
dc.contributor.author | Bae, Wan Ki | - |
dc.contributor.author | Lim, Jaehoon | - |
dc.contributor.author | Cho, Seong-Yong | - |
dc.date.accessioned | 2023-07-05T05:32:28Z | - |
dc.date.available | 2023-07-05T05:32:28Z | - |
dc.date.issued | 2022-08 | - |
dc.identifier.issn | 2196-7350 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/112922 | - |
dc.description.abstract | Colloidal quantum dot-based light-emitting diodes (QD-LEDs) are one of the potential future self-emissive displays owing to their large-scale solution-processibility and high color purity. For the industrial application of QD-LEDs, high-performance QD-LED and high-resolution patterning of quantum dot (QD) films are required. Photolithography is an ideal tool for patterning QD films. Previously, the high-resolution patterning of QD films using direct photolithography by ultra-thin atomic layer deposition of ZnO on the QD surface is reported. The patterning process is acceptable for Cd-based QD films, but the photoresist severely deteriorates the photoluminescence (PL) intensity of InP-based QD films owing to the presence of sulfonic groups in the photoactive compound. Herein, a non-destructive direct photolithography process for QD film patterning using a negative photoresist that does not affect the PL intensities of Cd- and InP-based QD films is reported. The effect of the photoresist is also verified by a PL lifetime study. Extremely bright Cd- and InP-based QD films are successfully patterned using a softer photoresist, and micropatterning of InP-based QD films is reported for the first time in this work using photolithography. A QD electroluminescence device is also successfully fabricated using the patterning method. © 2022 Wiley-VCH GmbH. | - |
dc.format.extent | 8 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | John Wiley and Sons Ltd | - |
dc.title | Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1002/admi.202200835 | - |
dc.identifier.scopusid | 2-s2.0-85133611384 | - |
dc.identifier.wosid | 000825716300001 | - |
dc.identifier.bibliographicCitation | Advanced Materials Interfaces, v.9, no.22, pp 1 - 8 | - |
dc.citation.title | Advanced Materials Interfaces | - |
dc.citation.volume | 9 | - |
dc.citation.number | 22 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.docType | 정기학술지(Article(Perspective Article포함)) | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | LIGHT-EMITTING-DIODES | - |
dc.subject.keywordPlus | FULL-COLOR | - |
dc.subject.keywordPlus | EFFICIENT | - |
dc.subject.keywordAuthor | atomic layer deposition | - |
dc.subject.keywordAuthor | InP quantum dot | - |
dc.subject.keywordAuthor | patterning quantum dot films | - |
dc.subject.keywordAuthor | photolithography | - |
dc.subject.keywordAuthor | quantum dot-based light emitting diodes | - |
dc.identifier.url | https://www.scopus.com/record/display.uri?eid=2-s2.0-85133611384&origin=inward&txGid=389d10cb7390d45cb0ef670e2c0c7481#funding-details | - |
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