Surface morphology engineering of WO3 films for increasing Li ion insertion area in electrochromic supercapacitors (ECSCs)

Abstract

Two different dry deposition methods were used to deposit electrode films with different surface morphologies in relation to the performance of electrochromic supercapacitors (ECSCs): direct current (DC) magnetron sputtering and the nanoparticle deposition system (NPDS). The NPDS method, which sprays powders onto the substrate using pressure differences, deposited WO3 film with its roughness of 36 nm and its thickness of 383 nm, while the sputtered WO3 film had its roughness of 3 nm and its thickness of 262 nm. Due to its dramatic difference in surface roughness, the NPDS-WO3 thin film had larger reaction surface area as well as Li-ion diffusion coefficient than those of sputtered-WO3 films. As a result, the ECSC device with NPDS-WO3 exhibited 19 % higher coloration efficiency with greater charge capacity compared to those with sputtered-WO3. However, the ECSC device with NPDS-WO3 showed different charge/discharge with trapped Li ions during the coloring(charging)/bleaching (discharge) processes respectively, leading to rapid degradation of the device. This research highlights the clear difference between its characteristics of the thin films fabricated using the NPDS vs. sputtering methods in relation to its surface roughness so that this study would be potentially beneficial in engineering various properties of ECSC devices.