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Influence of non-uniform intensity distribution of locally deformed pellicle for N7 patterning
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-22T15:27:02Z | - |
| dc.date.available | 2021-06-22T15:27:02Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2016-09-12 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/11755 | - |
| dc.publisher | SPIE | - |
| dc.title | Influence of non-uniform intensity distribution of locally deformed pellicle for N7 patterning | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | SPIE PHOTOMASK TECHNOLOGY | - |
| dc.relation.isPartOf | SPIE PHOTOMASK TECHNOLOGY | - |
| dc.citation.title | SPIE PHOTOMASK TECHNOLOGY | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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