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Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode

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dc.contributor.authorPark, Min-Joon-
dc.contributor.authorJung, Jin-Young-
dc.contributor.authorShin, Sun-Mi-
dc.contributor.authorSong, Jae-Won-
dc.contributor.authorNam, Yoon-Ho-
dc.contributor.authorKim, Dong-Hyung-
dc.contributor.authorLee, Jung-Ho-
dc.date.accessioned2021-06-22T17:22:59Z-
dc.date.available2021-06-22T17:22:59Z-
dc.date.created2021-01-21-
dc.date.issued2016-01-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/14572-
dc.description.abstractWe employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved.-
dc.language영어-
dc.language.isoen-
dc.publisherElsevier Sequoia-
dc.titlePhotoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Jung-Ho-
dc.identifier.doi10.1016/j.tsf.2015.12.062-
dc.identifier.scopusid2-s2.0-84958949846-
dc.identifier.wosid000369373600010-
dc.identifier.bibliographicCitationThin Solid Films, v.599, pp.54 - 58-
dc.relation.isPartOfThin Solid Films-
dc.citation.titleThin Solid Films-
dc.citation.volume599-
dc.citation.startPage54-
dc.citation.endPage58-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusATOMIC LAYER DEPOSITION-
dc.subject.keywordPlusWATER OXIDATION-
dc.subject.keywordPlusSILICON PHOTOANODES-
dc.subject.keywordPlusNICKEL-OXIDE-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusHEMATITE-
dc.subject.keywordPlusCELLS-
dc.subject.keywordAuthorSilicon-
dc.subject.keywordAuthorPhotoanode-
dc.subject.keywordAuthorAluminum trioxide-
dc.subject.keywordAuthorInterlayer-
dc.subject.keywordAuthorNickel oxide-
dc.subject.keywordAuthorCatalyst-
dc.subject.keywordAuthorOxygen evolution reaction-
dc.subject.keywordAuthorPhotoelectrochemical cell-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0040609015013127?via%3Dihub-
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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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