Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode
DC Field | Value | Language |
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dc.contributor.author | Park, Min-Joon | - |
dc.contributor.author | Jung, Jin-Young | - |
dc.contributor.author | Shin, Sun-Mi | - |
dc.contributor.author | Song, Jae-Won | - |
dc.contributor.author | Nam, Yoon-Ho | - |
dc.contributor.author | Kim, Dong-Hyung | - |
dc.contributor.author | Lee, Jung-Ho | - |
dc.date.accessioned | 2021-06-22T17:22:59Z | - |
dc.date.available | 2021-06-22T17:22:59Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2016-01 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/14572 | - |
dc.description.abstract | We employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Elsevier Sequoia | - |
dc.title | Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Jung-Ho | - |
dc.identifier.doi | 10.1016/j.tsf.2015.12.062 | - |
dc.identifier.scopusid | 2-s2.0-84958949846 | - |
dc.identifier.wosid | 000369373600010 | - |
dc.identifier.bibliographicCitation | Thin Solid Films, v.599, pp.54 - 58 | - |
dc.relation.isPartOf | Thin Solid Films | - |
dc.citation.title | Thin Solid Films | - |
dc.citation.volume | 599 | - |
dc.citation.startPage | 54 | - |
dc.citation.endPage | 58 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | WATER OXIDATION | - |
dc.subject.keywordPlus | SILICON PHOTOANODES | - |
dc.subject.keywordPlus | NICKEL-OXIDE | - |
dc.subject.keywordPlus | BEHAVIOR | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | HEMATITE | - |
dc.subject.keywordPlus | CELLS | - |
dc.subject.keywordAuthor | Silicon | - |
dc.subject.keywordAuthor | Photoanode | - |
dc.subject.keywordAuthor | Aluminum trioxide | - |
dc.subject.keywordAuthor | Interlayer | - |
dc.subject.keywordAuthor | Nickel oxide | - |
dc.subject.keywordAuthor | Catalyst | - |
dc.subject.keywordAuthor | Oxygen evolution reaction | - |
dc.subject.keywordAuthor | Photoelectrochemical cell | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0040609015013127?via%3Dihub | - |
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