Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, I.-S. | - |
dc.contributor.author | Kim, G.-J. | - |
dc.contributor.author | Yeung, M. | - |
dc.contributor.author | Barouch, E. | - |
dc.contributor.author | Oh, H.-K. | - |
dc.date.accessioned | 2021-06-22T18:09:54Z | - |
dc.date.available | 2021-06-22T18:09:54Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2016-03 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/15654 | - |
dc.description.abstract | Even though EUV lithography has extremely short wavelength source, a high numerical aperture(NA) system larger than 0.5 is required to make fine pattern of 1X nm and below. In order to avoid reflective efficiency loss and increase of chief ray angle of incident light, anamorphic high NA is suggested. Suggested anamorphic NA system has non-isotropic magnification which is varied 4X to 8X and the mask NA shape is ellipse due to non-isotropic magnification distribution. Anamorphic NA system has a non-conventional shadow effect due to non-isotropic incident angle distribution and magnification. These non-isotropic characteristics leads the reduction of asymmetric shadow distribution and it involves the reduction of horizontal-vertical bias. As a result anamorphic NA system can achieve balanced patterning results regardless of pattern direction and incident direction. © 2016 SPIE. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | SPIE | - |
dc.title | Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Oh, H.-K. | - |
dc.identifier.doi | 10.1117/12.2219874 | - |
dc.identifier.scopusid | 2-s2.0-84981298041 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.9776 | - |
dc.relation.isPartOf | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 9776 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Lithography | - |
dc.subject.keywordPlus | Anamorphic | - |
dc.subject.keywordPlus | High numerical aperture systems | - |
dc.subject.keywordPlus | High numerical apertures | - |
dc.subject.keywordPlus | Horizontal-vertical bias | - |
dc.subject.keywordPlus | Incident angles | - |
dc.subject.keywordPlus | Pattern direction | - |
dc.subject.keywordPlus | Shadow effects | - |
dc.subject.keywordPlus | Short wavelengths | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordAuthor | Anamorphic NA | - |
dc.subject.keywordAuthor | EUV lithography | - |
dc.subject.keywordAuthor | Shadow effects | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9776/1/Non-isotropic-shadow-effect-with-various-pattern-direction-in-anamorphic/10.1117/12.2219874.short | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.