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Optimization of meshed pellicle parameters for 16 nm node EUVL patterning
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-22T18:12:54Z | - |
| dc.date.available | 2021-06-22T18:12:54Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2014-10-27 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/15783 | - |
| dc.publisher | Sematech | - |
| dc.title | Optimization of meshed pellicle parameters for 16 nm node EUVL patterning | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | International Symposium on Extreme Ultraviolet lithography | - |
| dc.relation.isPartOf | International Symposium on Extreme Ultraviolet lithography | - |
| dc.citation.title | International Symposium on Extreme Ultraviolet lithography | - |
| dc.citation.conferencePlace | Washington D.C. | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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