Mechanical stress induced by external forces in the extreme ultraviolet pellicle
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, H.-J. | - |
dc.contributor.author | Park, E.-S. | - |
dc.contributor.author | Kim, I.-S. | - |
dc.contributor.author | Oh, H.-K. | - |
dc.date.accessioned | 2021-06-22T18:21:39Z | - |
dc.date.available | 2021-06-22T18:21:39Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2016-10 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/15965 | - |
dc.description.abstract | EUV pellicle with very thin thickness is significantly affected when external forces are applied. The mechanical forces such as chamber-pellicle pressure difference and stage acceleration cause the mechanical stress in pellicle. We investigated the maximum stress that can be induced by the pressure difference for various materials by using finite element method (FEM). We also used theoretical model and FEM for predicting the pellicle deformation. Our results show the mechanical deformation and the stress of full size (152 × 120 mm2) pellicle with 50 nm thickness, and the influence of the pellicle is increased with larger pressure difference. We also studied the maximum stress caused by the acceleration force of the scanner. The full size pellicle is greatly influenced with the specific pulse width causing resonance. Our study indicates that mechanical stress with acceleration is very small and can be ignored. © 2016 SPIE. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | SPIE | - |
dc.title | Mechanical stress induced by external forces in the extreme ultraviolet pellicle | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Oh, H.-K. | - |
dc.identifier.doi | 10.1117/12.2242174 | - |
dc.identifier.scopusid | 2-s2.0-85007002739 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.9985 | - |
dc.relation.isPartOf | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 9985 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Deformation | - |
dc.subject.keywordPlus | Finite element method | - |
dc.subject.keywordPlus | Photomasks | - |
dc.subject.keywordPlus | Stresses | - |
dc.subject.keywordPlus | Acceleration force | - |
dc.subject.keywordPlus | Extreme Ultraviolet | - |
dc.subject.keywordPlus | Mechanical deformation | - |
dc.subject.keywordPlus | Mechanical force | - |
dc.subject.keywordPlus | Mechanical stress | - |
dc.subject.keywordPlus | Pellicle | - |
dc.subject.keywordPlus | Pressure differences | - |
dc.subject.keywordPlus | Theoretical modeling | - |
dc.subject.keywordPlus | Acceleration | - |
dc.subject.keywordAuthor | Deformation | - |
dc.subject.keywordAuthor | EUV | - |
dc.subject.keywordAuthor | Pellicle | - |
dc.subject.keywordAuthor | Stress | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9985/1/Mechanical-stress-induced-by-external-forces-in-the-extreme-ultraviolet/10.1117/12.2242174.short | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.