Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ko, K.-H. | - |
dc.contributor.author | Mo, S.-Y. | - |
dc.contributor.author | Kim, I.-S. | - |
dc.contributor.author | Oh, H.-K. | - |
dc.date.accessioned | 2021-06-22T18:21:46Z | - |
dc.date.available | 2021-06-22T18:21:46Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2016-03 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/15971 | - |
dc.description.abstract | The absorption of extreme-ultraviolet (EUV) pellicle could be the most critical problem because the EUV source power is still not good enough for achieving mass production. We found that the transmission loss due to the EUV pellicle could be compensated through proper optical proximity correction (OPC) of a pellicled mask. Patterning results of OPCed masks with different transmission pellicles are shown for various 1D and 2D patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss even if a pellicle which has 80 % one-pass transmission is used. Therefore, the EUV pellicle manufacturing would be much easier because we can use much thicker film with higher absorption. © 2016 SPIE. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | SPIE | - |
dc.title | Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Oh, H.-K. | - |
dc.identifier.doi | 10.1117/12.2220155 | - |
dc.identifier.scopusid | 2-s2.0-84981295179 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.9776 | - |
dc.relation.isPartOf | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 9776 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Light sources | - |
dc.subject.keywordPlus | Photolithography | - |
dc.subject.keywordPlus | Throughput | - |
dc.subject.keywordPlus | Critical problems | - |
dc.subject.keywordPlus | EUV OPC | - |
dc.subject.keywordPlus | EUV pellicle | - |
dc.subject.keywordPlus | Extreme Ultraviolet | - |
dc.subject.keywordPlus | Extreme ultraviolets | - |
dc.subject.keywordPlus | Mass production | - |
dc.subject.keywordPlus | Optical proximity corrections | - |
dc.subject.keywordPlus | Transmission loss | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordAuthor | EUV OPC | - |
dc.subject.keywordAuthor | EUV pellicle | - |
dc.subject.keywordAuthor | Throughput | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9776/1/Throughput-compensation-through-optical-proximity-correction-for-realization-of-an/10.1117/12.2220155.short | - |
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