Real-time optical studies in the UV range of the annealing of zirconium-oxide thin films in vacuum
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cheon, Hyuknyeong | - |
dc.contributor.author | An, Ilsin | - |
dc.date.accessioned | 2021-06-22T20:43:07Z | - |
dc.date.available | 2021-06-22T20:43:07Z | - |
dc.date.issued | 2015-01 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.issn | 1976-8524 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/19260 | - |
dc.description.abstract | A multichannel spectroscopic ellipsometer is developed for real-time studies of thin films in a vacuum in the UV range. This system is mounted on a vacuum chamber to study the crystallization process of zirconium-oxide (ZrO2) thin film. The optical spectra of ZrO2 thin film are collected during the elevation of temperature. From the trend in the spectrum, we find that a threshold temperature for crystallization exists. Moreover, the crystallization occurs gradually over a certain range of temperatures between the threshold temperature and a critical temperature for full crystallization. The evolution of the dielectric function shows the development of critical peaks around 6.2 eV and 7.3 eV along with a shift of the absorption edge. To the best of our knowledge, this is the first in-situ study performed by using real-time vacuum UV spectroscopic ellipsometry, and we describe the system in detail. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | 한국물리학회 | - |
dc.title | Real-time optical studies in the UV range of the annealing of zirconium-oxide thin films in vacuum | - |
dc.type | Article | - |
dc.publisher.location | 대한민국 | - |
dc.identifier.doi | 10.3938/jkps.66.128 | - |
dc.identifier.scopusid | 2-s2.0-84921384445 | - |
dc.identifier.wosid | 000348139700027 | - |
dc.identifier.bibliographicCitation | Journal of the Korean Physical Society, v.66, no.1, pp 128 - 132 | - |
dc.citation.title | Journal of the Korean Physical Society | - |
dc.citation.volume | 66 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 128 | - |
dc.citation.endPage | 132 | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART001956381 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | SPECTROSCOPIC ELLIPSOMETRY | - |
dc.subject.keywordPlus | ZRO2 | - |
dc.subject.keywordPlus | MICROSTRUCTURE | - |
dc.subject.keywordPlus | DIELECTRICS | - |
dc.subject.keywordPlus | CAPACITOR | - |
dc.subject.keywordPlus | EVOLUTION | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | DRAMS | - |
dc.subject.keywordAuthor | Ellipsometer | - |
dc.subject.keywordAuthor | Vacuum UV | - |
dc.subject.keywordAuthor | Zirconium Oxide | - |
dc.identifier.url | https://link.springer.com/article/10.3938/jkps.66.128 | - |
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