Comparison imaging ellipsometry and its application to crystallization of indium oxide thin films
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Sungmo | - |
dc.contributor.author | Lee, Jungtae | - |
dc.contributor.author | Kim, Hyunjin | - |
dc.contributor.author | Kim, Jaekyun | - |
dc.contributor.author | Kim, Suenne | - |
dc.contributor.author | An, Ilsin | - |
dc.date.accessioned | 2021-06-22T09:25:54Z | - |
dc.date.available | 2021-06-22T09:25:54Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2019-11 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/2076 | - |
dc.description.abstract | Null imaging ellipsometry was developed to show the net change in polarization state between two samples. This system has no moving parts for nulling and does not exhibit azimuthal dependence on the optical elements. Therefore, this system is fast in data acquisition and easy to operate. In addition, image uniformity can be improved through a normalization process. For a demonstration, this system was applied to annealing studies of indium oxide thin films. The results show that this system can visualize the temperature dependence of the annealing as well as the progress of the annealing over time. Published by the AVS. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.title | Comparison imaging ellipsometry and its application to crystallization of indium oxide thin films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | An, Ilsin | - |
dc.identifier.doi | 10.1116/1.5122707 | - |
dc.identifier.scopusid | 2-s2.0-85074544211 | - |
dc.identifier.wosid | 000522021700069 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.37, no.6 | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 37 | - |
dc.citation.number | 6 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | ANNEALING TEMPERATURE | - |
dc.identifier.url | https://avs.scitation.org/doi/10.1116/1.5122707 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.