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Study of New Phase Shift Mask for the Reduction of Shadow Effect in 16nm Node
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-22T23:09:08Z | - |
| dc.date.available | 2021-06-22T23:09:08Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2010-11-21 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/22587 | - |
| dc.publisher | 대한 금속 재료 학회 | - |
| dc.title | Study of New Phase Shift Mask for the Reduction of Shadow Effect in 16nm Node | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | International Conference on Electronic Materials and Nanotechnology for Green Environment | - |
| dc.relation.isPartOf | International Conference on Electronic Materials and Nanotechnology for Green Environment | - |
| dc.citation.title | International Conference on Electronic Materials and Nanotechnology for Green Environment | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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