Imaging performance of mesh supported pellicle for extreme ultraviolet lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ko, Ki-Ho | - |
dc.contributor.author | Kim, Guk-Jin | - |
dc.contributor.author | Yeung, Michael | - |
dc.contributor.author | Barouch, Eytan | - |
dc.contributor.author | Oh, Hye-Keun | - |
dc.date.accessioned | 2021-06-22T23:23:02Z | - |
dc.date.available | 2021-06-22T23:23:02Z | - |
dc.date.issued | 2014-06 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.issn | 1347-4065 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/22832 | - |
dc.description.abstract | Extreme ultraviolet (EUV) lithography is the first candidate for 16 nm half pitch devices and EUV pellicle is needed for mask defect control. In order to check the effect of the pellicle on the EUV patterning, aerial image simulation including the meshed pellicle is performed. We found that the overall transmission drop caused by the pellicle structure might change the line width even though the contrast of the aerial image remained almost the same. The aerial images of 16 nm 1 : 1 line and space pattern with various pellicle structures are studied to see the effect of the meshed pellicle variables. Smaller mesh height and width, and larger mesh pitch of the pellicle support are preferred since transmission is better. (C) 2014 The Japan Society of Applied Physics | - |
dc.format.extent | 7 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | IOP Publishing Ltd | - |
dc.title | Imaging performance of mesh supported pellicle for extreme ultraviolet lithography | - |
dc.type | Article | - |
dc.publisher.location | 영국 | - |
dc.identifier.doi | 10.7567/JJAP.53.06JA02 | - |
dc.identifier.scopusid | 2-s2.0-84903311219 | - |
dc.identifier.wosid | 000338439500003 | - |
dc.identifier.bibliographicCitation | Japanese Journal of Applied Physics, v.53, no.6, pp 1 - 7 | - |
dc.citation.title | Japanese Journal of Applied Physics | - |
dc.citation.volume | 53 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 7 | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.identifier.url | https://iopscience.iop.org/article/10.7567/JJAP.53.06JA02 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.