Nanoparticle Removal with Megasonics: A Review

Abstract

Nanoparticle removal obtained without inflicting damage to fragile device elements remains a big challenge. The feasibility of physical cleans is assessed and boundary conditions are outlined. An overview of megasonic cleaning process improvements is given. In order to reduce damage without reducing particle removal frequencies during high frequency ultrasound cleaning processes, cavitation needs to be better controlled. This is partly achieved by (1) using pulsed acoustic fields which makes it possible to control the average bubble size and, at the same time, maximize the number of resonant bubbles, by (2) increasing the dissolved gas concentration and lowering the surface tension which facilitates bubble formation and, finally, by (3) introducing traveling waves to transport bubbles to the surface which needs to be cleaned.