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Double Patterning by using Resist Reflow Process for 22 nm node
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T00:53:53Z | - |
| dc.date.available | 2021-06-23T00:53:53Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2009-04-23 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/24940 | - |
| dc.publisher | 한국물리학회 | - |
| dc.title | Double Patterning by using Resist Reflow Process for 22 nm node | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | 2009년 봄 학술논문발표회 및 제 85회 정기총회 | - |
| dc.relation.isPartOf | 2009년 봄 학술논문발표회 및 제 85회 정기총회 | - |
| dc.citation.title | 2009년 봄 학술논문발표회 및 제 85회 정기총회 | - |
| dc.citation.conferencePlace | 대전컨벤션센터 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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