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Single-Scan Monochromatic Photonic Capacitance-Voltage Technique for Extraction of Subgap DOS Over the Bandgap in Amorphous Semiconductor TFTs

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dc.contributor.authorBae, Hagyoul-
dc.contributor.authorChoi, Hyunjun-
dc.contributor.authorJun, Sungwoo-
dc.contributor.authorJo, Chunhyung-
dc.contributor.authorKim, Yun Hyeok-
dc.contributor.authorHwang, Jun Seok-
dc.contributor.authorAhn, Jaeyeop-
dc.contributor.authorOh, Saeroonter-
dc.contributor.authorBae, Jong-Uk-
dc.contributor.authorChoi, Sung-Jin-
dc.contributor.authorKim, Dae Hwan-
dc.contributor.authorKim, Dong Myong-
dc.date.accessioned2021-06-23T02:02:30Z-
dc.date.available2021-06-23T02:02:30Z-
dc.date.created2021-01-21-
dc.date.issued2013-12-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/26265-
dc.description.abstractWe report a novel technique for simultaneous extraction of subgap donor-and acceptor-like density of states [g(D)(E) and g(A)(E)] over the subgap energy range (E-V<E<E-C) using a single-scan monochromatic photonic capacitance-voltage technique in n-channel amorphous indium-gallium-zinc-oxide thin-film transistors. In the proposed technique, we applied two different equivalent circuit models for the photoresponsive carriers excited from g(D)(E) and g(A)(E) under depletion (V-GS<V-FB) and accumulation (V-GS < V-FB) bias by employing a sub-bandgap optical source that includes a relation between photon energy (E-ph) and bandgap energy (E-g) as h nu = E-ph < E-g.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleSingle-Scan Monochromatic Photonic Capacitance-Voltage Technique for Extraction of Subgap DOS Over the Bandgap in Amorphous Semiconductor TFTs-
dc.typeArticle-
dc.contributor.affiliatedAuthorOh, Saeroonter-
dc.identifier.doi10.1109/LED.2013.2287511-
dc.identifier.scopusid2-s2.0-84889661169-
dc.identifier.wosid000327640400020-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.34, no.12, pp.1524 - 1526-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume34-
dc.citation.number12-
dc.citation.startPage1524-
dc.citation.endPage1526-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusDENSITY-OF-STATES-
dc.subject.keywordAuthorAcceptor-like states-
dc.subject.keywordAuthoramorphous-
dc.subject.keywordAuthordensity of states (DOS)-
dc.subject.keywordAuthordonor-like states-
dc.subject.keywordAuthorextraction-
dc.subject.keywordAuthorphotonic capacitance-
dc.subject.keywordAuthorthin-film transistors (TFT)-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/6656862-
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