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Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers

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dc.contributor.authorKim, Dong-Chan-
dc.contributor.authorKwon, Tae-Young-
dc.contributor.authorKim, Hyuk-Min-
dc.contributor.authorLim, Hyun-Woo-
dc.contributor.authorRoh, Ji-Young-
dc.contributor.authorLee, Sunyong Caroline-
dc.contributor.authorPark, Jin-Goo-
dc.date.accessioned2021-06-23T03:44:49Z-
dc.date.available2021-06-23T03:44:49Z-
dc.date.created2021-01-21-
dc.date.issued2013-04-
dc.identifier.issn1738-8228-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/28475-
dc.description.abstractThe optimum conditions for FOTS films deposited as vapor self-assembled monolayers for producing a hydrophobic film with low roughness was determined to be 10 Torr and 50 degrees C. The root mean square (RMS) of film roughness was 0.72 nm and its contact angle 108.14 degrees. These conditions are much simpler than the conventional process in which high temperature is known to result in high contact angles and reduced agglomeration of precursor molecules and roughness. However, we found that optimized hydrophobic FOTS film that provides an anti-stiction layer in micro-electro-mechanical systems can be obtained at low temperature and high pressure with a comparable contact angle to and lower roughness than the film obtained using the conventional process.-
dc.language영어-
dc.language.isoen-
dc.publisher대한금속·재료학회-
dc.titleOptimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Sunyong Caroline-
dc.contributor.affiliatedAuthorPark, Jin-Goo-
dc.identifier.doi10.3365/KJMM.2013.51.4.259-
dc.identifier.scopusid2-s2.0-84876530101-
dc.identifier.wosid000317559600002-
dc.identifier.bibliographicCitationKorean Journal of Metal and Materials, v.51, no.4, pp.259 - 264-
dc.relation.isPartOfKorean Journal of Metal and Materials-
dc.citation.titleKorean Journal of Metal and Materials-
dc.citation.volume51-
dc.citation.number4-
dc.citation.startPage259-
dc.citation.endPage264-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.identifier.kciidART001760281-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.subject.keywordPlusVAPOR-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordAuthorthin films-
dc.subject.keywordAuthorvapor deposition-
dc.subject.keywordAuthorsurface-
dc.subject.keywordAuthoratomic force microscopy (AFM)-
dc.subject.keywordAuthorself assembled monolayer-
dc.identifier.urlhttp://210.101.116.102/journal_korea/detail_01.asp?a_key=3129872-
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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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