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Numerical investigation of defect printability in extreme ultraviolet (EUV) reflector: Ru/Mo/Si multilayer system
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T05:07:24Z | - |
| dc.date.available | 2021-06-23T05:07:24Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2004-10-27 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/30191 | - |
| dc.publisher | 일본 응용물리학회 | - |
| dc.title | Numerical investigation of defect printability in extreme ultraviolet (EUV) reflector: Ru/Mo/Si multilayer system | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | Microprocesses and Nanotechnology Conference 2004 | - |
| dc.relation.isPartOf | Microprocesses and Nanotechnology Conference 2004 | - |
| dc.citation.title | Microprocesses and Nanotechnology Conference 2004 | - |
| dc.citation.conferencePlace | Osaka, Japan | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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