Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
High resolution of 193-nm lithography by liquid immersion
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T05:29:38Z | - |
| dc.date.available | 2021-06-23T05:29:38Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2004-02-23 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/30734 | - |
| dc.publisher | SPIE | - |
| dc.title | High resolution of 193-nm lithography by liquid immersion | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | SPIE, Microlithography Symposium | - |
| dc.relation.isPartOf | SPIE, Microlithography Symposium | - |
| dc.citation.title | SPIE, Microlithography Symposium | - |
| dc.citation.conferencePlace | 미국 산타 클라라 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.