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Results 1-2 of 2 (Search time: 0.003 seconds).
The Absorber Shape Dependency of Pattern Printability for Extreme Ultraviolet Lithography (EUVL)
오혜근
Article
Issue Date
2006
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13회 한국반도체학술대회
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한국물리학회
Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask as a Function of Pitch in 193 nm Lithography
오혜근
Article
Issue Date
2006
Citation
13회 한국반도체학술대회
Publisher
물리학회
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OH, HYE KEUN
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2006
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