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22 nm Node Process Latitude Variation due to Imperfect Reflection form EUV Mask Multilayer
오혜근
Conference
Issue Date
2008
Citation
2008 International Symposium on Extreme Ultraviolet Lithography
Publisher
SEMATECH
Place
California, Lake Tahoe
The Dependence of MEEF on the Mask Shadowing Effect
오혜근
Conference
Issue Date
2008
Citation
2008 International Symposium on Extreme Ultraviolet Lithography
Publisher
SEMATECH
Place
California, Lake Tahoe
1
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OH, HYE KEUN
2
Date Issued
2008
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