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Results 1-3 of 3 (Search time: 0.001 seconds).
Thermo-Mechanical Behavior Caused by Particle Defect on EUV Pellicle with Repeated EUV Exposure
오혜근
Conference
Issue Date
2018
Citation
Advanced Lithography
Publisher
SPIE
Place
San Jose, California, United States
Thermal deformation behavior with absorber for extreme ultraviolet mask
오혜근
Conference
Issue Date
2018
Citation
Advanced Lithography
Publisher
SPIE
Place
San Jose, California, United States
Enhanced Approach of Extreme-Ultraviolet Resist Considering Polymer Chain Interaction for Line Edge Roughness Improvement
오혜근
Conference
Issue Date
2018
Citation
Advanced Lithography
Publisher
SPIE
Place
San Jose, California, United States
1
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OH, HYE KEUN
3
Date Issued
2018
3
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