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Photography simulation on nonplanar substrate using FEM with absorbing boundaryconditions
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T09:11:36Z | - |
| dc.date.available | 2021-06-23T09:11:36Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 1997-03-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2020.sw.erica/36072 | - |
| dc.publisher | SPIE | - |
| dc.title | Photography simulation on nonplanar substrate using FEM with absorbing boundaryconditions | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | Microlithography | - |
| dc.relation.isPartOf | Microlithography | - |
| dc.citation.title | Microlithography | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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