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Substrate temperature dependence of the phase transition behavior of AIN layers grown on Si(111) substrate by metalorganic chemical vapor deposition

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dc.contributor.authorKim, Y. H.-
dc.contributor.authorKim, C. S.-
dc.contributor.authorNoh, Y. K.-
dc.contributor.authorKim, M. D.-
dc.contributor.authorOh, J. E.-
dc.date.accessioned2021-06-23T10:05:28Z-
dc.date.available2021-06-23T10:05:28Z-
dc.date.issued2011-11-
dc.identifier.issn0022-0248-
dc.identifier.issn1873-5002-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/36426-
dc.description.abstractThe microstructural properties of AIN layers grown on a Si(111) substrate were studied in detail using transmission electron microscope techniques to determine phase transition behaviors. AIN layers were grown in the wurtzite (WZ) and zinc-blende (ZB) polytypes. The dominant phase of AIN was transformed from a ZB structure to a WZ structure as the substrate temperature increased. Many protrusions were observed on the surfaces of AIN layers, and their density was decreased with an increase in the substrate temperature; these protrusions originated from the WZ structure of AIN and not the ZB structure. In our experiment, WZ-AIN grains were frequently observed at the edge and/or on the surface of the ZB-AIN grains at relatively low substrate temperatures. The preferred crystallographic orientation relationships of the {111}(ZB-AIN)parallel to{111}(si) and <1<(1)over bar>0>(ZB-AIN)parallel to<1<(1)over bar>0>(si) between the ZB-AIN and the Si substrate and the (0001)(WZ-AIN)parallel to(111)(si) and [(1) over bar2 (1) over bar0](WZ-AIN)//[1 (1) over bar()0](si) between WZ-AIN and the Si substrate were identified in our experiment. (C) 2011 Elsevier B.V. All rights reserved .-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE BV-
dc.titleSubstrate temperature dependence of the phase transition behavior of AIN layers grown on Si(111) substrate by metalorganic chemical vapor deposition-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.jcrysgro.2011.08.033-
dc.identifier.scopusid2-s2.0-80053327585-
dc.identifier.wosid000296269000032-
dc.identifier.bibliographicCitationJOURNAL OF CRYSTAL GROWTH, v.334, no.1, pp 189 - 194-
dc.citation.titleJOURNAL OF CRYSTAL GROWTH-
dc.citation.volume334-
dc.citation.number1-
dc.citation.startPage189-
dc.citation.endPage194-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaCrystallography-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryCrystallography-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusALUMINUM NITRIDE-
dc.subject.keywordPlusCUBIC ALGAN-
dc.subject.keywordPlusALN-
dc.subject.keywordPlusGAN-
dc.subject.keywordPlusINN-
dc.subject.keywordPlusMICROSTRUCTURE-
dc.subject.keywordPlusINTERFACE-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordPlusSILICON-
dc.subject.keywordAuthorCharacterization-
dc.subject.keywordAuthorCrystal structure-
dc.subject.keywordAuthorMetalorganic chemical vapor deposition-
dc.subject.keywordAuthorNitrides-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0022024811007160?via%3Dihub-
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