The influence of nitrogen and hydrogen ion irradiation on the step coverage ofTin barrier metals deposited with remoteplasma metal organic chemical vapor deposition

오재응

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The influence of nitrogen and hydrogen ion irradiation on the step coverage ofTin barrier metals deposited with remoteplasma metal organic chemical vapor deposition

Authors: 오재응

Issue Date: 1-Feb-1996

Citation: 제 3회 대한 전자 공학회반도체 학술대회

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/36807

Conference Name: 제 3회 대한 전자 공학회반도체 학술대회

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Appears in Collections: COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 2. Conference Papers

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